Specific Process Knowledge/Characterization/SEM LEO: Difference between revisions
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|style="background:WhiteSmoke; color:black"|<b>SEM LEO (Leo 1550 SEM)</b> | |style="background:WhiteSmoke; color:black"|<b>SEM LEO (Leo 1550 SEM)</b> | ||
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!style="background:silver; color:black | !style="background:silver; color:black" align="center" valign="center" rowspan="2"|Purpose | ||
|style="background:LightGrey; color:black"|Imaging and measurement of | |style="background:LightGrey; color:black"|Imaging and measurement of | ||
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*Any (semi)conducting sample that may have thin (> ~ 5 µm) layers of non-conducting materials on top | *Any (semi)conducting sample that may have thin (> ~ 5 µm) layers of non-conducting materials on top | ||
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|style="background:LightGrey; color:black"|Other purpose | |||
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*E-beam lithography using Raith Elphy Quantum system | |||
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!style="background:silver; color:black;" align="center" width="60"|Location | !style="background:silver; color:black;" align="center" width="60"|Location | ||
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*Any standard cleanroom materials. | *Any standard cleanroom materials. | ||
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