Specific Process Knowledge/Characterization/SEM: Scanning Electron Microscopy: Difference between revisions
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!colspan="2" border="none" style="background:silver; color:black;" align="center"|Equipment | !colspan="2" border="none" style="background:silver; color:black;" align="center"|Equipment | ||
|style="background:WhiteSmoke; color:black" align="center"|[[Specific Process Knowledge/Characterization/SEM LEO|SEM | |style="background:WhiteSmoke; color:black" align="center"|[[Specific Process Knowledge/Characterization/SEM LEO|SEM LEO]] | ||
|style="background:WhiteSmoke; color:black" align="center"|[[/Supra1|SEM Supra 1]] | |style="background:WhiteSmoke; color:black" align="center"|[[/Supra1|SEM Supra 1]] | ||
|style="background:WhiteSmoke; color:black" align="center"|[[/Supra2|SEM Supra 2]] | |style="background:WhiteSmoke; color:black" align="center"|[[/Supra2|SEM Supra 2]] | ||
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|style="background:LightGrey; color:black"| Imaging and measurement of | |style="background:LightGrey; color:black"| Imaging and measurement of | ||
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* Any (semi)conducting sample that may have thin ( | * Any (semi)conducting sample that may have thin (~ 5 µm <) layers of non-conducting materials on top | ||
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* Any sample except bulk insulators such as polymers, glass or quartz wafers | * Any sample except bulk insulators such as polymers, glass or quartz wafers | ||
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* Any sample except bulk insulators such as polymers, glass or quartz wafers | * Any sample except bulk insulators such as polymers, glass or quartz wafers | ||
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* | * Any sample except bulk insulators such as polymers, glass or quartz wafers | ||
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* Conductive samples--> | * Conductive samples--> | ||
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* 1-2 nm (limited by vibrations) | * 1-2 nm (limited by vibrations) | ||
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* | * 1-2 nm (limited by vibrations) | ||
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* ~3.5 nm (limited by instrument)--> | * ~3.5 nm (limited by instrument)--> | ||
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* Secondary electron (Se2) | * Secondary electron (Se2) | ||
* Inlens secondary electron (Inlens) | * Inlens secondary electron (Inlens) | ||
* 4 Quadrant Backscatter electron (QBSD | * 4 Quadrant Backscatter electron (QBSD) | ||
* Variable pressure secondary electron (VPSE) | * Variable pressure secondary electron (VPSE) | ||
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* Variable pressure secondary electron (VPSE) | * Variable pressure secondary electron (VPSE) | ||
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* Secondary electron ( | * Secondary electron (Se2) | ||
* | * Inlens secondary electron (Inlens) | ||
* High Definition four quadrant Angular Selective Backscattered electron detector (HDAsB) | |||
* Variable pressure secondary electron (VPSE) | |||
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* Secondary electron (Everhart-Thornley (ETD)) | * Secondary electron (Everhart-Thornley (ETD)) | ||
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* Z: XXX mm | * Z: XXX mm | ||
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* X, Y: | * X, Y: 130 × 130 mm | ||
* T: - | * T: -4 to 70<sup>o</sup> | ||
* R: 360<sup>o</sup> | * R: 360<sup>o</sup> | ||
* Z: | * Z: 50 mm | ||
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* X, Y: 25 × 25 mm | * X, Y: 25 × 25 mm | ||
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* FEG (Field Emission Gun) source | * FEG (Field Emission Gun) source | ||
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* | * FEG (Field Emission Gun) sour | ||
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* Tungsten filament--> | * Tungsten filament--> | ||
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* Variable at Low vacuum (0.1 mbar-2 mbar) | * Variable at Low vacuum (0.1 mbar-2 mbar) | ||
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* Fixed at High vacuum | * Fixed at High vacuum (2 × 10<sup>-4</sup>mbar - 10<sup>-6</sup>mbar) | ||
* Variable at Low vacuum (0.1 mbar-2 mbar) | |||
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* High vacuum and Low vacuum--> | * High vacuum and Low vacuum--> | ||
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* Oxford Instruments X-Max<sup>N</sup> 50 mm<sup>2</sup> SDD EDX detector and AZtec software package | * Oxford Instruments X-Max<sup>N</sup> 50 mm<sup>2</sup> SDD EDX detector and AZtec software package | ||
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*High Definition four quadrant Angular Selective Backscattered electron detector (HDAsB) | |||
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* Focused ion beam (FIB) (Ga<sup>+</sup> ions)--> | * Focused ion beam (FIB) (Ga<sup>+</sup> ions)--> | ||
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* Up to 8" wafer with 6" view | * Up to 8" wafer with 6" view | ||
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* Up to | * Up to 6" wafer with full view | ||
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* Wafers won´t fit without a proper holder. The height of the sample is critical, should be as small, as possible--> | * Wafers won´t fit without a proper holder. The height of the sample is critical, should be as small, as possible--> | ||
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* Any standard cleanroom material including graphene or CNT samples | * Any standard cleanroom material including graphene or CNT samples | ||
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* Conductive materials | * Conductive materials | ||