Specific Process Knowledge/Wafer cleaning/Cleaning with Soap Sonic: Difference between revisions
| Line 1: | Line 1: | ||
== Cl[[Image: | == Cl[[Image:Sonic-clean.jpg|300x300px|thumb|Soap sonic clean placed in the wash bench in the changing room. <br />Wet Etch of Chromium can take place in a beaker in this fume hood]]eaning of wafers or chips that have been out of the cleanroom. == | ||
The soap sonic is done in a ultrasonic tank placed in the wash bench in the changing room. The soap sonic is Triton x100 which is free of alkalies. It is used for wafers or chips that has been out of the cleanroom eg. if they have been diced, and you want to bring them in again for measurement or further processing. The soap sonic clean is not enough, you also have to make a piranha clean. | The soap sonic is done in a ultrasonic tank placed in the wash bench in the changing room. The soap sonic is Triton x100 which is free of alkalies. It is used for wafers or chips that has been out of the cleanroom eg. if they have been diced, and you want to bring them in again for measurement or further processing. The soap sonic clean is not enough, you also have to make a piranha clean. | ||
![→Cl[[Image:fumehoodetch-chrom.jpg|300x300px|thumb|Fume hood: positioned in cleanroom 2. <br />Wet Etch of Chromium can take place in a beaker in this fume hood]]eaning of wafers or chips that have been out of the cleanroom.](/index.php?title=Specific_Process_Knowledge/Wafer_cleaning/Cleaning_with_Soap_Sonic#ClImage:fumehoodetch-chrom.jpg|300x300px|thumb|Fume_hood:_positioned_in_cleanroom_2._<br_/>Wet_Etch_of_Chromium_can_take_place_in_a_beaker_in_this_fume_hoodeaning_of_wafers_or_chips_that_have_been_out_of_the_cleanroom.){kind=link}