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Specific Process Knowledge/Lithography/DUVStepperLithography: Difference between revisions

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Makei (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, danchip
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Makei (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, danchip
129 edits
Line 46: Line 46:
|style="background:LightGrey; color:black"|Projection lens Numerical Aperture
|style="background:LightGrey; color:black"|Projection lens Numerical Aperture
|style="background:WhiteSmoke; color:black" align="center" colspan="2"|
|style="background:WhiteSmoke; color:black" align="center" colspan="2"|
0,60
0,4 - 0,60
|-
|-
|style="background:LightGrey; color:black"|Illumination system's sigma
|style="background:LightGrey; color:black"|Illumination system's sigma
|style="background:WhiteSmoke; color:black" align="center" colspan="2"|
|style="background:WhiteSmoke; color:black" align="center" colspan="2"|
0,65 (usual illumination mode)
0,2 - 0,75 (standard illumination mode: \sigma = 0,65)
|-
|-
|style="background:LightGrey; color:black"|Exposure source
|style="background:LightGrey; color:black"|Exposure source
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