Specific Process Knowledge/Lithography/Coaters/Spin Coater: Gamma UV processing: Difference between revisions
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=Standard Processes= | =Standard Processes= | ||
==HMDS priming== | ==HMDS priming== | ||
The standard HMDS priming process has been developed to mimic the behavior of the IMTEC Star2000 HMDS oven | The standard HMDS priming process has been developed to mimic the behavior of the IMTEC Star2000 HMDS oven, which produces a contact angle of 81-82° on an oxidized silicon surface. The fast HMDS priming has been developed to have a process time of approximately one minute, in order to match the process time of typical coating and softbaking processes. | ||
General information on HMDS priming can be found [[Specific_Process_Knowledge/Lithography/Coaters/Spin_Coater:_Gamma_UV_processing#HMDS priming|here]]. | |||
''Sequence names, process parameters, and test results (Sequence no. 0000-0999):'' | ''Sequence names, process parameters, and test results (Sequence no. 0000-0999):'' | ||