Specific Process Knowledge/Lithography/CSAR: Difference between revisions
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== Contrast Curves == | == Contrast Curves == | ||
100 nm lines in ~ | 100 nm lines in both ~70 nm and ~188 nm thick CSAR has been developed with AR-600-546 (standard CSAR developer) at room temperature. | ||
{|border="1" cellspacing="0" cellpadding="3" style="text-align:left;" style="width: 95%" | {|border="1" cellspacing="0" cellpadding="3" style="text-align:left;" style="width: 95%" | ||
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!colspan="5"| | !colspan="5"|CSAR Contrast Curve, Processed by TIGRE, FEB-MARCH 2016 | ||
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|-style="background:WhiteSmoke; color:black" | |-style="background:WhiteSmoke; color:black" | ||
|CSAR AR-P6200 AllResist | |CSAR AR-P6200 AllResist, CSAR AR-P6200 diluted 1:1 in Anisole | ||
| | |08-02-2016, LabSpin E-5, 4000 rpm, 60s, softbaked 60s @ 205 degC | ||
| | |09-02-2016, JBX9500 E-2, 2nA aperture 5, doses 40-600 µC/cm2, 100 nm lines and 300 nm spaces | ||
| | |11-02-2016, Fumehood D-2, AR-600-546, rinsed in IPA 60s. | ||
| | |02-03-2016 AFM Icon, F-2, ScanAsyst in Air | ||
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|} | |} | ||
[[File: | [[File:ContrastCurvesCSAR_March2016_log.png|500px]] | ||
== Dosetests == | == Dosetests == | ||