Specific Process Knowledge/Etch/ICP Metal Etcher/Titanium: Difference between revisions

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===TiO2 etch, tested by Evgeniy Shkondin===
Recipe used: Ti etch
[[File:TiO2_etch_Evgeniy.jpg|400px]]

Revision as of 14:20, 10 February 2016

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Titanium etch

Ti etch
Parameter Process 1 Process 2
Cl2 (sccm) 30 30
HBr (sccm) - -
Pressure (mTorr) 3, Strike 3 secs @ 15 mTorr??? 3
Coil power (W) 800 900
Platen power (W) 100 50
Temperature (oC) 20 20
Spacers (mm) 30 30
Etch rate (nm/min) 152 64
AZ resist selectivity 0.67 0.83
Etch rate in TiO2 (nm/min)


TiO2 etch, tested by Evgeniy Shkondin

Recipe used: Ti etch