Jump to content

Specific Process Knowledge/Lithography/EBeamLithography: Difference between revisions

← Older editNewer edit →
VisualWikitext
Tigre (talk | contribs)
DCH-Employees-701
2,257 edits
No edit summary
Tigre (talk | contribs)
DCH-Employees-701
2,257 edits
Line 10: Line 10:


!colspan="2" border="none" style="background:silver; color:black;" align="center"|Equipment  
!colspan="2" border="none" style="background:silver; color:black;" align="center"|Equipment  
|style="background:silver; color:black;" align="left"|[[Specific_Process_Knowledge/Lithography/EBeamLithography/JEOL_JBX-9500FSZ|JEOL JBX-9500FSZ]]
|style="background:silver; color:black;" align="left"|'''[[Specific_Process_Knowledge/Lithography/EBeamLithography/JEOL_JBX-9500FSZ|JEOL JBX-9500FSZ]]'''
|style="background:silver; color:black;" align="left"|'''Raith Elphy'''
|style="background:silver; color:black;" align="left"|'''Raith Elphy'''
|-
|-
Line 80: Line 80:


<br clear="all" />
<br clear="all" />


= E-beam resists and Process Flows =
= E-beam resists and Process Flows =
Retrieved from "https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Lithography/EBeamLithography"