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Specific Process Knowledge/Lithography: Difference between revisions

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*E-beam sensitive
*E-beam sensitive
**ZEP502A, [[/CSAR|CSAR]] , PMMA (positive)
**AR-P6200 CSAR, ZEP502A , PMMA, HSQ, mr-EBL, AR-N 7520
**HSQ, Ma-N 2403, AR-N 7520 (negative)
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*Imprint polymers:
*Imprint polymers:
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=Equipment Pages=
=Equipment Pages=
Retrieved from "https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Lithography"