Specific Process Knowledge/Thermal Process/Dope with Boron: Difference between revisions

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	[[image:60min_Predep_WET950.jpg\|500x600px\|left\|thumb\|SIMS Measurement at 5 different positions after pre-deposition of boron.The SIMS measurement shows a good uniformity across the wafer]]		[[image:60min_Predep_WET950.jpg\|500x600px\|left\|thumb\|SIMS Measurement at 5 different positions after pre-deposition of boron.The SIMS measurement shows a good uniformity across the wafer]]