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Specific Process Knowledge/Thermal Process/Dope with Boron: Difference between revisions

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DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
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Kabi (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
1,142 edits
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|[[image:Boron_doping_profiles-w1.jpg|500x600px|left|thumb|SIMS Measurement at 4 different positions after Pre-deposition of boron]]||[[image:Waferlayout.jpg|400x400px|right|thumb|Sample position on the wafer]]|
[[image:Boron_doping_profiles-w1.jpg|500x600px|left|thumb|SIMS Measurement at 4 different positions after Pre-deposition of boron]][[image:Waferlayout.jpg|400x400px|right|thumb|Sample position on the wafer]]


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