Specific Process Knowledge/Etch/AOE (Advanced Oxide Etch): Difference between revisions
Appearance
No edit summary |
|||
| Line 17: | Line 17: | ||
== Process information == | == Process information == | ||
*[[Specific Process Knowledge/Etch/Etching of Silicon Oxide/SiO2 etch using AOE|Etch of Silicon Oxide | *[[Specific Process Knowledge/Etch/Etching of Silicon Oxide/SiO2 etch using AOE|Etch of Silicon Oxide]] | ||
*[[/Si etch using AOE|Si | *[[/Si etch using AOE|Etch of Si]] | ||
*[[/Remove resist in the AOE|Remove resist | *[[/Remove resist in the AOE|Remove/etch resist/barc]] | ||
*[[Specific Process Knowledge/Etch/Etching of Bulk Glass/AOE etching of fused silica|Fused | *[[Specific Process Knowledge/Etch/Etching of Bulk Glass/AOE etching of fused silica|Etch of Fused Silica]] | ||
*[[/Quartz etch using AOE|Quartz | *[[/Quartz etch using AOE|Etch of Quartz - special very thick samples]] | ||
*[[/Silicon Nitride Etch using AOE|Silicon Nitride | *[[/Silicon Nitride Etch using AOE|Etch of Silicon Nitride]] | ||
===Limitations using the AOE=== | ===Limitations using the AOE=== | ||