Specific Process Knowledge/Etch/ICP Metal Etcher/Chromium: Difference between revisions
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===Chromium etch in ICP metal=== | ===Chromium etch in ICP metal - small substrate using carrier=== | ||
The Chromium etch was carried out on the following substrate stack: | The Chromium etch was carried out on the following substrate stack: | ||
2" Si wafer with Cr laying in a 6" Si wafer with a 4" recess. The area outside the recess was covered by AZ resist. | 2" Si wafer with Cr laying in a 6" Si wafer with a 4" recess. The area outside the recess was covered by AZ resist. | ||