Specific Process Knowledge/Characterization/SEM LEO: Difference between revisions
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[[image:IMG_3290.jpg|400x400px|right|thumb|Picosun R200 ALD, positioned in cleanroom F-2.]] | [[image:IMG_3290.jpg|400x400px|right|thumb|Picosun R200 ALD, positioned in cleanroom F-2.]] | ||
A Danchip there are | A Danchip there are four scanning electron microscopes (SEMs). These SEMs cover a wide range of needs both in the cleanroom and outside: From the fast in-process verification of different process parameters such as etch rates, step coverages or lift-off quality to the ultra high resolution images on any type of sample intended for publication. | ||
All SEMs are operated by use of the same software, hardpanel and joystick. But there are small hardware differences, thus a training is needed for each SEM you want to use. | |||
The SEM LEO was installed in the cleanroom in the 1998, and the software was ungraded in 2012. | The SEM LEO was installed in the cleanroom in the 1998, and the software was ungraded in 2012. | ||
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This SEM will cover most users need. It is a very reliable and rugged instrument that provides high quality images of most samples. Excellent images on a large variety of materials such as semiconductors, semiconductor oxides or nitrides, metals, thin films and some polymers may be acquired on the SEM. | This SEM will cover most users need. It is a very reliable and rugged instrument that provides high quality images of most samples. Excellent images on a large variety of materials such as semiconductors, semiconductor oxides or nitrides, metals, thin films and some polymers may be acquired on the SEM. | ||
The SEM is is equipped with a Raith e-beam writing system | The SEM LEO is good, reliable, the software is basically indentical to the SEM Zeiss software, and for conducting samples (or thin layers, < 5-10 µm, of hard non-conducting materials such as oxide/nitride on top a conducting substrate) the resolution of the SEM LEO is almost comparable to the both the SEM 1, SEM 2 and SEM 3 Supra 60VP. | ||
The SEM is is equipped with a Raith e-beam writing system. | |||