Specific Process Knowledge/Lithography/Coaters/Spin Coater: Gamma UV processing: Difference between revisions
| Line 167: | Line 167: | ||
|-style="background:WhiteSmoke; color:black" | |-style="background:WhiteSmoke; color:black" | ||
|Silicon with native oxide | |Silicon with native oxide | ||
|1.513 | |1.513 µm | ||
|0.6% | |0.6% | ||
|26/3 2015 | |26/3 2015 | ||
| Line 175: | Line 175: | ||
|-style="background:WhiteSmoke; color:black" | |-style="background:WhiteSmoke; color:black" | ||
|Silicon with native oxide | |Silicon with native oxide | ||
|1.509 | |1.509 µm | ||
|0.3% | |0.3% | ||
|4/11 2015 | |4/11 2015 | ||