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| '''The user manual, user APV, and contact information can be found in [http://labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=362 LabManager]''' | | '''The user manual, user APV, and contact information can be found in [http://labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=362 LabManager]''' |
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| ==Spin Coater: Manual All Purpose==
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| [[Image:IMG 1175.JPG|300x300px|thumb|right|Spin Coater: Manual All Purpose located in fumehood in C-1]]
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| '''Feedback to this section''': '''[mailto:labadviser@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Lithography/Coaters#Spin_Coater:_Manual_All_Purpose click here]'''
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| ''[[Specific_Process_Knowledge/Lithography/Coaters#Coaters:_Comparison_Table|Coater comparison table]]''
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| Manual Spinner 1, WS-650 model, from Laurell is a resist spinning coater at Danchip which can be used for spinning on whole 2", 4" and 6" substrates and also a small pieces.
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| The system can be used for spinning all resists, but remember to clean the spinner with an appropriate solvents, which can remove the resist residues.
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| '''The user manual, user APV, and contact information can be found in [http://labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=315 LabManager]'''
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