Specific Process Knowledge/Lithography/Coaters/Spin Coater: Gamma UV processing: Difference between revisions
No edit summary |
|||
| Line 54: | Line 54: | ||
''Sequence names, process parameters, and test results (Sequence no. 0000-0999):'' | ''Sequence names, process parameters, and test results (Sequence no. 0000-0999):'' | ||
*'''( | *'''(0011) HMDS Standard''' | ||
VPO temperature: 120°C <br> | VPO temperature: 120°C <br> | ||
Process parameters: 30s vacuum bake @ -0.67 bar, HMDS injection, 90s reaction @ ambient, 20s cooling @ 21°C. | Process parameters: 30s vacuum bake @ -0.67 bar, HMDS injection, 90s reaction @ ambient, 20s cooling @ 21°C. | ||
| Line 98: | Line 98: | ||
*''' ( | *''' (0012) HMDS fast''' | ||
VPO temperature: 120°C <br> | VPO temperature: 120°C <br> | ||
Process parameters: 30s vacuum bake @ -0.67 bar, HMDS injection, 15s reaction @ ambient, 20s cooling @ 21°C. | Process parameters: 30s vacuum bake @ -0.67 bar, HMDS injection, 15s reaction @ ambient, 20s cooling @ 21°C. | ||