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Line 338: |
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| == Field stitching ==
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| In this experiment, several writing fields (1 mm x 1 mm) were stitched together. Vernier scales on the edges of each writing field shows the field stitching bewteen fields.
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| {|border="1" cellspacing="0" cellpadding="3" style="text-align:left;" style="width: 95%"
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| |-style="background:Black; color:White"
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| !colspan="6"|wafer 11.17 Stitching accuracy, Processed by TIGRE, April 2015
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| |-style="background:WhiteSmoke; color:black"
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| !Resist
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| !E-beam exposure
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| !Development
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| !Metallisation
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| !Lift-off
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| !Characterisation
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| |-style="background:WhiteSmoke; color:black"
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| |CSAR AR-P6200 AllResist, 4000 rpm, 60s, softbaked 60s @ 150degC
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| |JBX9500 E-2, 2nA aperture 5, dose 300 µC/cm2, L1: 1st set of Vernier scales on edges (North, Upper Right, East, Lower Right, South, Lower Left, West, Upper Left) of entire writi9ng field
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| |AR-600-546, 60 s
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| |5 nm Ti, 45 nm Au, Wordentec (D-2)
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| |AR-600-71, 5-10 min, 4s ultrasonic (D-3)
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| |Zeiss Supra 60VP, 10kV, Inlens detector
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| |}
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| [[File:FieldToField.png|700px]]
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| <br> <br>
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| == Overlay accuracy (layer to layer stitching) == | | == Overlay accuracy (layer to layer stitching) == |
