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Specific Process Knowledge/Lithography/EBeamLithography: Difference between revisions

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|Standard positive resist, very similar to ZEP520.
|Standard positive resist, very similar to ZEP520.
|[[media:Allresist_CSAR62_English.pdf‎|Allresist_CSAR62_English.pdf‎]],, [[media:CSAR_62_Abstract_Allresist.pdf‎|CSAR_62_Abstract_Allresist.pdf‎]]
|[[media:Allresist_CSAR62_English.pdf‎|Allresist_CSAR62_English.pdf‎]],, [[media:CSAR_62_Abstract_Allresist.pdf‎|CSAR_62_Abstract_Allresist.pdf‎]]
|[[Specific_Process_Knowledge/Lithography/Coaters#Manual Spinner 1|Manual Spinner 1 (Laurell)]], [[Specific_Process_Knowledge/Lithography/Coaters#Spin_coater:_Manual_Labspin|Spin Coater Labspin]]
|See table <u>[[http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Lithography/Coaters#Coaters:_Comparison_Table|here]] <\u>
|Anisole
|Anisole
|AR-600-546, AR-600-548, N50, MIBK:IPA
|AR-600-546, AR-600-548, N50, MIBK:IPA
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