Specific Process Knowledge/Lithography/EBeamLithography: Difference between revisions
| Line 163: | Line 163: | ||
|[[Specific_Process_Knowledge/Lithography/Coaters#Manual Spinner 1|Manual Spinner 1 (Laurell)]], [[Specific_Process_Knowledge/Lithography/Coaters#Spin_coater:_Manual_Labspin|Spin Coater Labspin]] | |[[Specific_Process_Knowledge/Lithography/Coaters#Manual Spinner 1|Manual Spinner 1 (Laurell)]], [[Specific_Process_Knowledge/Lithography/Coaters#Spin_coater:_Manual_Labspin|Spin Coater Labspin]] | ||
|Anisole | |Anisole | ||
| | |AR-600-546, AR-600-548, N50, MIBK:IPA | ||
|IPA | |IPA | ||
|AR-600-71, 1165 Remover | |AR-600-71, 1165 Remover | ||
| Line 207: | Line 207: | ||
|[[Specific_Process_Knowledge/Lithography/Coaters#Manual Spinner 1|Manual Spinner 1 (Laurell)]], [[Specific_Process_Knowledge/Lithography/Coaters#Spin_coater:_Manual_Labspin|Spin Coater Labspin]] | |[[Specific_Process_Knowledge/Lithography/Coaters#Manual Spinner 1|Manual Spinner 1 (Laurell)]], [[Specific_Process_Knowledge/Lithography/Coaters#Spin_coater:_Manual_Labspin|Spin Coater Labspin]] | ||
|PGME | |PGME | ||
| | |AR 600-55, MIBK:IPA | ||
| | | | ||
|acetone/1165 | |acetone/1165 | ||