Specific Process Knowledge/Lithography/UVLithography: Difference between revisions
| Line 11: | Line 11: | ||
[[File:UVLPic2.png|160px|right]] | [[File:UVLPic2.png|160px|right]] | ||
'''Before you plan your UV processing and request for training on any equipment in UV lithography, please go through the following steps.''' | '''Before you plan your UV processing and request for training on any equipment in UV lithography, please go through the following steps.''' Include the information in the training request. | ||
If you are new to photolithography, you can visit <u>[https://en.wikipedia.org/wiki/Photolithography this]</u> wikipedia webpage about photolithography before you start. | If you are new to photolithography, you can visit <u>[https://en.wikipedia.org/wiki/Photolithography this]</u> wikipedia webpage about photolithography before you start. | ||
<br> <br> | <br> <br> | ||
| Line 29: | Line 30: | ||
** For dry etch or wet etch processes, investigate the resist etch rate of your process as this might limit the minimum thickness of your resist. | ** For dry etch or wet etch processes, investigate the resist etch rate of your process as this might limit the minimum thickness of your resist. | ||
*'''Exposure''': Choose which mask aligner you wish to use | *'''Exposure''': Choose which mask aligner you wish to use, and consider the exposure dose. | ||
** You can find a list of mask aligners <u>[[Specific_Process_Knowledge/Lithography/UVExposure|here]]</u>. | |||
** You can find information on dose <u>[[Specific_Process_Knowledge/Lithography/UVExposure_Dose|here]]</u>. | |||
* '''Mask''': Design and order a photomask for your UV process. A detailed instruction on how to design and order a photomask can be found <u>[[Specific_Process_Knowledge/Lithography/Pattern_Design_and_Mask_Fabrication|here]]</u>. | * '''Mask''': Design and order a photomask for your UV process. A detailed instruction on how to design and order a photomask can be found <u>[[Specific_Process_Knowledge/Lithography/Pattern_Design_and_Mask_Fabrication|here]]</u>. | ||
* '''Development''': Choose which equipment you wish to use to develop your photoresist from <u>[[Specific_Process_Knowledge/Lithography/Development|this]]</u> | * '''Development''': Choose which equipment you wish to use to develop your photoresist from <u>[[Specific_Process_Knowledge/Lithography/Development|this list]]</u>. Remember the development chemistry influences the <u>[[Specific_Process_Knowledge/Lithography/UVExposure_Dose|exposure dose]]</u>. | ||
* '''Specify whether you wish to strip or lift-off your resist''': <u>[[Specific_Process_Knowledge/Lithography/Strip|strip]]</u> and <u>[[Specific_Process_Knowledge/Lithography/LiftOff|lift-off]]</u>. | * '''Specify whether you wish to strip or lift-off your resist''': <u>[[Specific_Process_Knowledge/Lithography/Strip|strip]]</u> and <u>[[Specific_Process_Knowledge/Lithography/LiftOff|lift-off]]</u>. | ||