Specific Process Knowledge/Lithography/UVLithography: Difference between revisions
| Line 13: | Line 13: | ||
[[File:UVLPic1.png|400px|right]] | [[File:UVLPic1.png|400px|right]] | ||
<br> | <br><br><br> | ||
[[File:UVLPic2.png|180px|right]] | [[File:UVLPic2.png|180px|right]] | ||
| Line 37: | Line 37: | ||
* '''Development''': Choose which equipment you wish to use to develop your photoresist from [[Specific_Process_Knowledge/Lithography/Development|this]] list. | * '''Development''': Choose which equipment you wish to use to develop your photoresist from [[Specific_Process_Knowledge/Lithography/Development|this]] list. | ||
* '''Specify whether you wish to strip or lift-off your resist''': [[Specific_Process_Knowledge/Lithography/Strip|strip]] and [[Specific_Process_Knowledge/Lithography/LiftOff|lift-off]]. | * '''Specify whether you wish to strip or lift-off your resist''': [[Specific_Process_Knowledge/Lithography/Strip|strip]] and [[Specific_Process_Knowledge/Lithography/LiftOff|lift-off]]. | ||