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[[File:UVLPic1.png|400px|right]]
[[File:UVLPic1.png|400px|right]]
* '''Prepare a process flow''' which describes all steps in your UV lithography process. You can find docx-templates [[Specific_Process_Knowledge/Lithography/UVLithography#Resist_Overview|in this table]].
* '''Substrate pretreatment''': In many processes it is recommended to [[Specific_Process_Knowledge/Lithography/Pretreatment|pretreat or prime]] your wafer before spin-coating. In some [[Specific_Process_Knowledge/Lithography/Coaters|spin-coaters]], these pretreatment processes are included in the spin coating of resist.
* '''Spin Coater''': Do you wish to use a manual spin coater or a robot spin coater? A manual spin coater is recommended for batches < 5 wafers. See a list of spin coaters [[Specific_Process_Knowledge/Lithography/Coaters|here]].
* '''Resist Type''': Choose the type of resist you wish to use:
* '''Resist Type''': Choose the type of resist you wish to use:
** Positive tone resist: Resist exposed to UV light will be dissolved in the developer. The mask is an exact copy of the pattern which is to remain on the wafer.
** Positive tone resist: Resist exposed to UV light will be dissolved in the developer. The mask is an exact copy of the pattern which is to remain on the wafer.
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** For dry or wet etch processes, investigate the resist etch rate of your process as this might limit the minimum thickness of your resist.
** For dry or wet etch processes, investigate the resist etch rate of your process as this might limit the minimum thickness of your resist.


* '''Substrate pretreatment''': In many processes it is recommended to [[Specific_Process_Knowledge/Lithography/Pretreatment|pretreat or prime]] your wafer before spin-coating. In some [[Specific_Process_Knowledge/Lithography/Coaters|spin-coaters]], these pretreatment processes are included in the spin coating of resist.
 


* '''Mask''': Design and order a photomask for your UV process. A detailed instruction on how to design and order a photomask can be found [[Specific_Process_Knowledge/Lithography/Pattern_Design_and_Mask_Fabrication|here]].
* '''Mask''': Design and order a photomask for your UV process. A detailed instruction on how to design and order a photomask can be found [[Specific_Process_Knowledge/Lithography/Pattern_Design_and_Mask_Fabrication|here]].


* '''Prepare a process flow''' which describes all steps in your UV lithography process. You can find templates [[Specific_Process_Knowledge/Lithography/UVLithography#Resist_Overview|in this table]].
 


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