Specific Process Knowledge/Thermal Process/A1 Bor Drive-in furnace: Difference between revisions
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==A1 Furnace Boron drive-in== | ==A1 Furnace Boron drive-in== | ||
[[Image:A1.JPG|thumb|300x300px|A1 Boron drive in furnace:positioned in cleanroom 2]] | [[Image:A1.JPG|thumb|300x300px|A1 Boron drive in furnace: positioned in cleanroom 2]] | ||
A1 Furnace boron drive-in is a Tempress horizontal furnace for oxidation of silicon wafers, annealing and for drive-in of boron after a pre-deposition of boron in the A2 Furnace boron pre-dep. It can also be used for drive in of boron which has been ion implanted. | A1 Furnace boron drive-in is a Tempress horizontal furnace for oxidation of silicon wafers, annealing and for drive-in of boron after a pre-deposition of boron in the A2 Furnace boron pre-dep. It can also be used for drive in of boron which has been ion implanted. | ||