Specific Process Knowledge/Lithography/EBeamLithography/RaithElphyManual: Difference between revisions
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= Purpose, location and technical specifications = | = Purpose, location and technical specifications = | ||
The Raith Elphy system is a pattern generator built onto the [[Specific_Process_Knowledge/Characterization/SEM:_Scanning_Electron_Microscopy/Leo|LEO SEM]]. | |||
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*The spot beam for electron beam writing is generated by a ZrO/W emitter and a four-stage electron beam focusing lens system, see illustration below. | *The spot beam for electron beam writing is generated by a ZrO/W emitter and a four-stage electron beam focusing lens system, see illustration below. | ||
= Mounting of chips or wafers into cassette = | = Mounting of chips or wafers into cassette = | ||
Revision as of 13:07, 28 September 2015
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Purpose, location and technical specifications
The Raith Elphy system is a pattern generator built onto the LEO SEM.
Location
Techical Specification
The system can be characterized as follows:
- The spot beam for electron beam writing is generated by a ZrO/W emitter and a four-stage electron beam focusing lens system, see illustration below.