Specific Process Knowledge/Lithography/EBeamLithography/FilePreparation: Difference between revisions
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== Double current exposure == | == Double current exposure == | ||
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Before running a double-current exposure, you should receive training from a person from the e-beam staff. If this procedure is not performed correctly, it might end up in large pattern shifts. | Before running a double-current exposure, you should receive training from a person from the e-beam staff. If this procedure is not performed correctly, it might end up in large pattern shifts. | ||