Specific Process Knowledge/Lithography/EBeamLithography/FilePreparation: Difference between revisions
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== Dose variation == | == Dose variation == | ||
<span style="font-size: 90%; text-align: right;">[[Specific_Process_Knowledge/Lithography/EBeamLithography/FilePreparation#top|Go to top of this page]]</span> | |||
The dose modulation is defined in a percentage addition to the base dose, i.e. the final dose, Q, is given by the base dose, RESIST, and modulation, m, by this formula: | The dose modulation is defined in a percentage addition to the base dose, i.e. the final dose, Q, is given by the base dose, RESIST, and modulation, m, by this formula: | ||
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</pre> | </pre> | ||
== Double current exposure == | == Double current exposure == | ||