Specific Process Knowledge/Characterization/XPS/Processing/Basics/2highres: Difference between revisions
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To correct the faulty fitting, two new constraints (marked in the table by a blue square) have been applied. The top one fixes the bulk peak binding energy in the range 98 to 100 eV and the bottom one fixes the oxide peak to a 2 eV wide energy range 3.5 eV above the bulk peak. Applying a constraint to a parameter is simple done by writing (using the right notation, of course) in the table - removing is done by deleting. | To correct the faulty fitting, two new constraints (marked in the table by a blue square) have been applied. The top one fixes the bulk peak binding energy in the range 98 to 100 eV and the bottom one fixes the oxide peak to a 2 eV wide energy range 3.5 eV above the bulk peak. Applying a constraint to a parameter is simple done by writing (using the right notation, of course) in the table - removing is done by deleting. | ||
To apply the constraints on all levels (if several levels are available) one has to | To apply the constraints on all etch levels (if several levels are available) one has to | ||
# Click in the upper left corner of the 'Peak Fit' table to select all values and constraints. | # Click in the upper left corner of the 'Peak Fit' table to select all values and constraints. | ||
# Right click inside the table and select 'Propagate Selected Constraints/Values..' as shown below. | # Right click inside the table and select 'Propagate Selected Constraints/Values..' as shown below. | ||
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[[File:XPS-basics19b.jpg|300px]] | [[File:XPS-basics19b.jpg|300px]] | ||
The result is that we have fitted all levels of the Si2p peak. Since silicon is not the only element in the sample, we need to apply the same procedures to the other core levels. The analysis continues <span>[[Specific_Process_Knowledge/Characterization/XPS/Processing/Basics/3fitting#top|here]]</span>. | The result is that we have fitted all etch levels of the Si2p peak. Since silicon is not the only element in the sample, we need to apply the same procedures to the other core levels. The analysis continues <span>[[Specific_Process_Knowledge/Characterization/XPS/Processing/Basics/3fitting#top|here]]</span>. | ||