Specific Process Knowledge/Characterization/XPS/Processing/Basics/1intro: Difference between revisions

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 <span style="font-size: 90%; text-align: right;">[[Specific_Process_Knowledge/Characterization/XPS/Processing/Basics/1intro#top|Go to top of this page]]</span>
-As shown (marked with a red square) in the bottom of the image below, some experiments hold several etch levels - the reason is that the exeriment is a depth profile in which a repeated set of  spectra of a sample are recorded as the surface is gradually removed by an ion bombardment. Scroll through the individual levels, either by using the 'Etch time' or 'Etch Level' scroll buttons and see how the spectra change. Level 0 is the first spectrum.
+As shown (marked with a red square) in the bottom of the image below, some experiments hold several etch levels - the reason is that the exeriment is a depth profile in which a repeated set of  spectra of a sample are recorded as the surface is gradually removed by an ion bombardment. Scroll through the individual etch levels, either by using the 'Etch time' or 'Etch Level' scroll buttons and see how the spectra change. Level 0 is the first spectrum.
 [[File:XPS-basics03b.jpg|700px]]