Specific Process Knowledge/Characterization: Difference between revisions
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== Choose equipment == | == Choose equipment == | ||
'''AFM''' | '''AFM''' | ||
*[[/AFM: Atomic Force Microscopy|AFM - ''Atomic Force Microscopy'']] | *[[/AFM: Atomic Force Microscopy|AFM - ''Atomic Force Microscopy'']] | ||
'''Element analysis''' | |||
*[[/SIMS: Secondary Ion Mass Spectrometry#Atomika_SIMS|Atomika SIMS]] | |||
*[[/XPS#XPS-ThermoScientific|XPS-ThermoScientific ]] | |||
'''Optical and stylus profilers''' | '''Optical and stylus profilers''' | ||
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*[[/Optical characterization#Prism_Coupler|Prism Coupler]] | *[[/Optical characterization#Prism_Coupler|Prism Coupler]] | ||
*[[/PL Mapper|PL mapper - ''Photoluminescence mapper'']] | *[[/PL Mapper|PL mapper - ''Photoluminescence mapper'']] | ||
''' | |||
*[[/ | |||
*[[/ | '''SEM's at CEN''' | ||
*[[/SEM FEI QUANTA 200 3D|FIB-SEM FEI QUANTA 200 3D]] | |||
*[[/Dual Beam FEI Helios Nanolab 600|Dual Beam FEI Helios Nanolab 600]] | |||
*[[/SEM FEI Nova 600 NanoSEM|SEM FEI Nova 600 NanoSEM]] | |||
*[[/SEM FEI Quanta 200 ESEM FEG|SEM FEI Quanta 200 ESEM FEG]] | |||
*[[/SEM Inspect S|SEM Inspect S]] | |||
'''SEM's at Danchip''' | |||
*[[/SEM: Scanning Electron Microscopy |SEM LEO]] | |||
*[[/SEM: Scanning Electron Microscopy |SEM JEOL]] | |||
*[[/SEM: Scanning Electron Microscopy |SEM Zeiss]] | |||
*[[/SEM: Scanning Electron Microscopy |SEM Zeiss Supra 60 VP]] | |||
*[[/SEM: Scanning Electron Microscopy |SEM Supra 3]] | |||
'''TEM's at CEN''' | |||
'''Various''' | '''Various''' | ||
*[[/Drop Shape Analyzer|Drop Shape Analyzer]] | *[[/Drop Shape Analyzer|Drop Shape Analyzer]] |
Revision as of 09:27, 14 September 2015
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Choose characterization topic
- Element analysis
- Measurement of film thickness and optical constants
- Photoluminescence mapping
- Sample imaging
- Sample preparation for inspection
- Stress measurement
- Wafer thickness measurement
- Topographic measurement
- Contact angle measurement
- Four-Point_Probe (Resistivity measurement)
- Carrier density (doping) profiler
- Scanning Electron Microscopy
Choose equipment
AFM
Element analysis
Optical and stylus profilers
Optical microscopes
Optical characterization
SEM's at CEN
- FIB-SEM FEI QUANTA 200 3D
- Dual Beam FEI Helios Nanolab 600
- SEM FEI Nova 600 NanoSEM
- SEM FEI Quanta 200 ESEM FEG
- SEM Inspect S
SEM's at Danchip
TEM's at CEN
Various