Specific Process Knowledge/Characterization/XPS/Processing/Basics/1intro: Difference between revisions

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 This generates a plot in which the atomic percentage of each peak is plotted as a function of etch time.
-[[File:XPS-basics06f.jpg|500px]]
+[[File:XPS-basics06f.jpg|700px]]
 From this plot several points are open for discussion:
-* '''Which peaks to add''': The two spin-orbit doublets Si2p and Cu2p should be treated differently. The Si2p peak is treated as one peak because of the small spin-orbit splitting (the splitting is 0.63 eV less than the 1 eV step size of the survey spectrum, see [[Specific Process Knowledge/Characterization/XPS/Processing/Basics/2highres#anchor_peaktable1|table in the next section]])
+* '''Which peaks to add''': The two spin-orbit doublets Si2p and Cu2p should be treated differently. The Si2p doublet peak is treated as one peak because of the small spin-orbit splitting (the splitting is 0.63 eV less than the 1 eV step size of the survey spectrum, see [[Specific Process Knowledge/Characterization/XPS/Processing/Basics/2highres#anchor_peaktable1|table in the next section]]). In contrast, the Cu2p doublet has some 20 eV's of spin-orbit splitting - as such the peaks may be fitted individually. The best way of fitting and quatinfying is to omit one of the peaks as is the case with the Zn2p doublet. This is easily done by removing the checkmark in the 'Q' column of one of the Cu2p peaks.
+* '''Etching through thin layers: Probe depth and etch rates''': It looks as if the copper layer is contaminated with ZnO - at least the signals of Zn and O are not zero.
 From here the data may be exported to Excel or Word by using the options on the 'W Reporting' tab next to the 'Display Modes' in the upper right corner of the GUI.