Specific Process Knowledge/Thermal Process/Oxidation: Difference between revisions
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<nowiki>**</nowiki>These wafers must be placed in a "transport box from RCA to furnace" using the RCA carrier when doing RCA or the pre-dep carrier after pre-dep. | <nowiki>**</nowiki>These wafers must be placed in a "transport box from RCA to furnace" using the RCA carrier when doing RCA or the pre-dep carrier after pre-dep. | ||
==Oxidation curves== | ==Oxidation curves== | ||
===A1 Furnace <100>-Si Wet Oxidation=== | ===A1 Furnace <100>-Si Wet Oxidation=== | ||
[[Image:A1_furnace_100_Si_wet_oxidation.jpg]] | [[Image:A1_furnace_100_Si_wet_oxidation.jpg]] | ||
===A3 Furnace <100>-Si Wet Oxidation=== | ===A3 Furnace <100>-Si Wet Oxidation=== | ||
[[Image:A3_furnace_100_Si_wet_oxidation.jpg]] | [[Image:A3_furnace_100_Si_wet_oxidation.jpg]] | ||