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Specific Process Knowledge/Wafer cleaning/IMEC: Difference between revisions

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Bureaucrats, danchip, Administrators
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BGE (talk | contribs)
Bureaucrats, danchip, Administrators
2,908 edits
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|2
|2
|Piranha
|Piranha
|Mixture: H2SO4:H2O2 (4:1)
|Mixture: H<math>_2</math>SO<math>_4</math>:H<math>_2</math>O<math>_2</math> (4:1)
Temp: 80 <sup>o</sup>C
Temp: 80 <sup>o</sup>C
Time: 5 min
Time: 5 min
(a yellow and a black spot)
(a yellow and a black spot)
|Clean tank (cleanroom 4, 7-up bath for wafers) and make your own or make in dedicated glass.
|Clean tank (cleanroom 4, 7-up bath for wafers) and make your own or make in dedicated glass.
Pour up H2SO4 first, put wafers in carrier (USE this in steps4.1-4.6), add H2O2, wait 30 sec, dip wafers.
Pour up H<math>_2</math>SO<math>_4</math> first, put wafers in carrier (USE this in steps4.1-4.6), add H2O2, wait 30 sec, dip wafers.
|Maybe clean the tank the day before!
|Maybe clean the tank the day before!
|-
|-
Line 56: Line 56:
|Piranha
|Piranha
|Not nitride wafers!
|Not nitride wafers!
Mixture: H2SO4:H2O2 (4:1)
Mixture: H<math>_2</math>SO<math>_4</math>:H<math>_2</math>O<math>_2</math> (4:1)
Temp: 80 <sup>o</sup>C
Temp: 80 <sup>o</sup>C
Time: 20 min
Time: 20 min
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