Specific Process Knowledge/Thin film deposition: Difference between revisions
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[[/Deposition of Silicon Nitride|Silicon Nitride]] - ''and oxynitride'' <br/> | [[/Deposition of Silicon Nitride|Silicon Nitride]] - ''and oxynitride'' <br/> | ||
[[/Deposition of Silicon Oxide|Silicon Oxide]]<br/> | [[/Deposition of Silicon Oxide|Silicon Oxide]]<br/> | ||
[[/Deposition of Titanium Oxide|Titanium Oxide]]<br/> | [[/Deposition of Titanium Oxide|Titania (TiO<sub>2</sub>, Titanium Oxide)]]<br/> | ||
[[/Deposition of Alumina|Alumina (Al<sub>2</sub>O<sub>3</sub>, Aluminium Oxide)]]<br/> | |||
[[/Lesker|Alumina (Al<sub>2</sub>O<sub>3</sub>, Aluminium Oxide)]]<br/> | [[/Lesker|Alumina (Al<sub>2</sub>O<sub>3</sub>, Aluminium Oxide)]]<br/> | ||
[[/Lesker|Tantalum (Ta<sub>2</sub>O<sub>5</sub>, Tantalum pentoxide)]]<br/> | [[/Lesker|Tantalum (Ta<sub>2</sub>O<sub>5</sub>, Tantalum pentoxide)]]<br/> | ||