Specific Process Knowledge/Thin film deposition/Deposition of Titanium Oxide: Difference between revisions

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 ==Deposition of Titanium Oxide==
-Titanium oxide can be deposited only by sputter technique. At the moment the only system where we have a target for Titanium oxide is [[Specific Process Knowledge/Etch/IBE⁄IBSD Ionfab 300|IBE/IBSD Ionfab300]]. The target is Ti. During the sputter deposition oxygen is added to the chamber resulting in Titanium oxide on the sample.
+Titanium oxide can be deposited either by a sputter technique or by use of ALD (atomic layer deposition). At the moment the only system where we have a target for Titanium oxide is [[Specific Process Knowledge/Etch/IBE⁄IBSD Ionfab 300|IBE/IBSD Ionfab300]]. The target is Ti. During the sputter deposition oxygen is added to the chamber resulting in Titanium oxide on the sample.
 *[[/IBSD of TiO2|TiO2 made on IBE/IBSD Ionfab300]]