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Specific Process Knowledge/Thin film deposition/Deposition of Titanium Oxide: Difference between revisions

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DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
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Pevo (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
2,370 edits
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*unknown
*unknown
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*Covers sample everywhere (but long purge time needed very very high aspect ratio structures)
*Temperature dependent - Anatase or amorphous TiO<sub>2</sub>
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*Not Known
*Not Known
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*Very good. Covers sample everywhere (but long purge time needed very very high aspect ratio structures)
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*120<sup>o</sup>C - 150<sup>o</sup>C: Amorphous TiO<sub>2</sub>
*120<sup>o</sup>C - 150<sup>o</sup>C: Amorphous TiO<sub>2</sub>
*300<sup>o</sup>C - 3450<sup>o</sup>C: Anatase TiO<sub>2</sub>   
*300<sup>o</sup>C - 350<sup>o</sup>C: Anatase TiO<sub>2</sub>   
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*
*
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*
*[[/Specific_Process_Knowledge/Thin_film_deposition/ALD_Picosun_R200#Equipment_performance_and_process_related_parameters|TiO2 deposition using ALD]]
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