Specific Process Knowledge/Lithography/EBeamLithography/JBX9500Manual: Difference between revisions
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= Detailed descriptions of subprograms = | |||
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== SFOCUS == | |||
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== PDEFBE == | |||
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The most important output of PDEFBE is the gain shift value which is 1.4 nm (in Y); the maximum allowable gain correction in this condition file (0.2nA ap5) is 6 nm. If PDEFBE did not reach a shift value below 6 nm within 3 retries for this condition file, the scan position on the BE mark should be shifted or a new BE mark should be used instead. | The most important output of PDEFBE is the gain shift value which is 1.4 nm (in Y); the maximum allowable gain correction in this condition file (0.2nA ap5) is 6 nm. If PDEFBE did not reach a shift value below 6 nm within 3 retries for this condition file, the scan position on the BE mark should be shifted or a new BE mark should be used instead. | ||
== DISTMEM and DISTBE == | |||
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== SUBDEFBE == | |||
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The machines measures over a field specified in the subprogram but no larger than the main field size (4 µm x 4 µm). | The machines measures over a field specified in the subprogram but no larger than the main field size (4 µm x 4 µm). | ||
== DRIFT == | |||
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== HEIMAP == | |||
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==SETWFR== | |||
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= Troubleshooting = | = Troubleshooting = | ||