Specific Process Knowledge/Lithography/EBeamLithography/JBX9500Manual: Difference between revisions
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!style="background:#ADD8E6; color:Black"|SFOCUS | !style="background:#ADD8E6; color:Black"|[[Specific_Process_Knowledge/Lithography/EBeamLithography/JBX9500Manual#SFOCUS|SFOCUS]] | ||
|This subprogram finds the minimum beam diameter by scanning an AE mark while changing the focus of the objective lens. The objective lens is defined to be in focus where the machine finds the minimum beam diameter. This program can also be used to observe the depth of focus of a certain condition file. '''The SFOCUS''' subprogram does not work well for currents above 6 nA, why SFOCUS is deleted in 'daily' routines of condition files with currents larger than 6 nA. | |This subprogram finds the minimum beam diameter by scanning an AE mark while changing the focus of the objective lens. The objective lens is defined to be in focus where the machine finds the minimum beam diameter. This program can also be used to observe the depth of focus of a certain condition file. '''The SFOCUS''' subprogram does not work well for currents above 6 nA, why SFOCUS is deleted in 'daily' routines of condition files with currents larger than 6 nA. | ||
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