Specific Process Knowledge/Lithography/EBeamLithography/BEAMER: Difference between revisions
| Line 119: | Line 119: | ||
ARRAY (-10000,2,10000)/(10000,1,10000) | ARRAY (-10000,2,10000)/(10000,1,10000) | ||
ASSIGN P(1)-> ((1,1),SHOT1) | ASSIGN P(1)-> ((1,1),SHOT1) | ||
ASSIGN P(1)-> ((1,2), | ASSIGN P(1)-> ((1,2),SHOT2) | ||
ASSIGN P(1)-> ((2,1), | ASSIGN P(1)-> ((2,1),SHOT3) | ||
ASSIGN P(1)-> ((2,2), | ASSIGN P(1)-> ((2,2),SHOT4) | ||
AEND | AEND | ||
PEND | PEND | ||