Specific Process Knowledge/Lithography/EBeamLithography/JBX9500Manual: Difference between revisions
| Line 542: | Line 542: | ||
<span style="font-size: 90%; text-align: right;">[[Specific_Process_Knowledge/Lithography/EBeamLithography/JBX9500Manual#top|Go to top of this page]]</span> | <span style="font-size: 90%; text-align: right;">[[Specific_Process_Knowledge/Lithography/EBeamLithography/JBX9500Manual#top|Go to top of this page]]</span> | ||
SETWFR is the subprogram that finds and scan your global marks, i.e. P and Q marks. | |||
Before executing SETWFR you should edit the parameters. Enter | |||
# Measurement mode: Choose Semi-automatic. | |||
# Material type: Wafer | |||
# Material size: your substrate size, choose 3.0 if you expose on a chip | |||
# Multi-piece window: the position of your substrate | |||
# Allowable rotation value: 2-10 degrees | |||
# Material Center offset position: Enter the offset found in your pre-align measurement | |||
# P (and Q) point design position (material system): enter the position of your P (and Q) mark in wafer/chip coordinate system. | |||
Save the subprogram and execute it. | |||
If it does not work, the machine will ask you whether you wish to find the marks manually by using the SEM. Before you do that, adjust the parameters of SETWFR with one (or all) of the follwing things and execute SETWFR again: | |||
# Increase the rough scan width of both P and Q mark to around 300 µm | |||
# Set the BE coarse gain to 60 in the rough scan of P and Q mark (see under 'Gain' tab) | |||
# Change the interlaced scan from 'X -> Y' to 'Y -> X', 'X only', or 'Y only' (see under 'Scan' tab) | |||
If nothing of the above work, accept to find the mark manually by using the SEM. Please be aware that you should only '''roughly''' find the mark with the SEM, i.e. center it on the screen, and '''not''' align with the SEM. | |||
When SETWFR has been executed succesfully, it will give you a corrected offset; use the offset in the section 'P-point mark measurement results'. If in doubt, elaborate the SETWFR output below and see the offset marked in red. | |||
{| class = "collapsible collapsed" width=100% style = "border-radius: 10px; border: 1px solid #CE002D;" | {| class = "collapsible collapsed" width=100% style = "border-radius: 10px; border: 1px solid #CE002D;" | ||
! width=100% | ========= OUTPUT of SETWFR Final result | ! width=100% | ========= OUTPUT of SETWFR Final result ================== | ||
|- | |- | ||
| | | | ||
| Line 623: | Line 643: | ||
Design position (material coordinates) X,Y[um] = -35000.0000 0.0000 | Design position (material coordinates) X,Y[um] = -35000.0000 0.0000 | ||
Observation position (material coordinates) X,Y[um] = -34944.1516 -233.4722 | Observation position (material coordinates) X,Y[um] = -34944.1516 -233.4722 | ||
Offset X,Y[um] = 55.8484 -233.4722 | <FONT COLOR="FFFFFF">Offset X,Y[um] = 55.8484 -233.4722</FONT> | ||
Mark rotation angle(+clockwise) [degree] = -3.119790e-01 | Mark rotation angle(+clockwise) [degree] = -3.119790e-01 | ||
Height measurement = No height measurement | Height measurement = No height measurement | ||