Specific Process Knowledge/Thermal Process/Furnace: Multipurpose annealing: Difference between revisions
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*O<sub>2</sub>: 10 slm | *O<sub>2</sub>: 10 slm | ||
*H<sub>2</sub>: 5 slm (max 2 slm for vacuum processes) | *H<sub>2</sub>: 5 slm (max 2 slm for vacuum processes) | ||
*N<sub>2</sub>- | *N<sub>2</sub> mix : 10 slm (for H<sub>2</sub>-N<sub>2</sub> gas mixture) | ||
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!style="background:silver; color:black" align="center" valign="center" rowspan="2"|Substrates | !style="background:silver; color:black" align="center" valign="center" rowspan="2"|Substrates | ||