Jump to content

Specific Process Knowledge/Thin Film deposition/ALD/TiO2 deposition using ALD: Difference between revisions

← Older editNewer edit →
VisualWikitext
Bghe (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, Bureaucrats, Administrators
7,317 edits
Eves (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
4,346 edits
Line 28: Line 28:
|-  
|-  
!Purge time
!Purge time
|3.0 s
|4.0 s
|4.0 s
|5.0 s
|-
|-
|}
|}


====TiO<sub>2</sub> deposition rates====
====TiO<sub>2</sub> deposition rates====
Retrieved from "https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Thin_Film_deposition/ALD/TiO2_deposition_using_ALD"