Specific Process Knowledge/Lithography/UVLithography: Difference between revisions
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::A list of UV lithography resist types available at DTU Danchip can be found [[Specific_Process_Knowledge/Lithography/UVLithography#Resist_Overview|on this page]]. | ::A list of UV lithography resist types available at DTU Danchip can be found [[Specific_Process_Knowledge/Lithography/UVLithography#Resist_Overview|on this page]]. | ||
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* '''Thickness of resist''': In general, it is recommended to work | * '''Thickness of resist''': In general, it is recommended to work at or below an aspect ratio of ~1, i.e. where the width of the pattern is not smaller than the thickness of the resist. Furthermore, when you decide for the resist thickness, consider which transfer you need: | ||
** For [[Specific_Process_Knowledge/Lithography/LiftOff|lift-off]] processes, we recommend resist thicknnesses ~5 times larger than the thickness of the metal to be lifted. | ** For [[Specific_Process_Knowledge/Lithography/LiftOff|lift-off]] processes, we recommend resist thicknnesses ~5 times larger than the thickness of the metal to be lifted. | ||
** For dry or wet etch processes, investigate the resist etch rate of your process as this might limit the minimum thickness of your resist. | ** For dry or wet etch processes, investigate the resist etch rate of your process as this might limit the minimum thickness of your resist. | ||