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For Si wafers, anatase TiO<sub>2</sub> is best grown on wafers without native oxide (removed using BHF), and amorphous TiO<sub>2</sub> is best grown on wafers with native oxide.
For Si wafers, anatase TiO<sub>2</sub> is best grown on wafers without native oxide (removed using BHF), and amorphous TiO<sub>2</sub> is best grown on wafers with native oxide.
XPS measurements shows that at temperaturs below 120 <sup>o</sup>C the TiO<sub>2</sub> layer will be contaminated with about 1-3 % chlorine molecules from the TiCl<sub>4</sub> precursor. This can be seen as small white dots in SEM images of the anatase TiO<sub>2</sub> layers.


===TiO<sub>2</sub> standard recipe===
===TiO<sub>2</sub> standard recipe===
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