Specific Process Knowledge/Thin Film deposition/ALD/TiO2 deposition using ALD: Difference between revisions
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===TiO<sub>2</sub> results=== | ===TiO<sub>2</sub> results=== | ||
Some some SEM images of TiO<sub>2</sub> deposited on a | Some some SEM images of TiO<sub>2</sub> deposited on a Si surface at different temperatures between 150 <sup>o</sup>C and 350 <sup>o</sup>C are shown below. Some of samples have been treated with HF (hydrofluoric acid) to remove the native oxide layer silicon samples just before the ALD deposition. | ||
<gallery caption="Titanium dioxide | <gallery caption="Titanium dioxide deposited at different temperatures on a Si surface" widths="250px" heights="250px" perrow="3"> | ||
image:TiO2 150C 1200 cycles Si_HF_treated.jpg| Temperature 150 <sup>o</sup>C, 1200 cycles, HF treated. | image:TiO2 150C 1200 cycles Si_HF_treated.jpg| Temperature 150 <sup>o</sup>C, 1200 cycles, HF treated. | ||
image:TiO2 150C 1200 cycles Si_untreated.jpg| Temperature 150 <sup>o</sup>C, 1200 cycles. | image:TiO2 150C 1200 cycles Si_untreated.jpg| Temperature 150 <sup>o</sup>C, 1200 cycles. | ||