Specific Process Knowledge/Lithography/EBeamLithography/JBX9500Manual: Difference between revisions
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Alignment of wafer or chip requires specific training. | Alignment of wafer or chip requires specific training. | ||
First time you align on a | First time you align on a type of wafer marks, you need to optimise the gain settings of the scan. The gain settings will depend on resist thickness, mark type (metal or etch) and substrate type. The gain settings can be found by the subprogram '''ACGRG'''. | ||
When the gain settings are known, you can execute SETWFR and CHIPAL. | When the gain settings are known, you can execute '''SETWFR''' and '''CHIPAL'''. | ||
== AGCRG == | == AGCRG == | ||