Specific Process Knowledge/Lithography/EBeamLithography/JBX9500Manual: Difference between revisions

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 === DRIFT ===
-[[File:drift.png|400px|right]]
+You can choose any mark as a DRIFT mark. In a standard exposure, a (bottom plane) BE mark is used as DRIFT mark, but you can ask the machine to use one of your global marks as well, i.e. P or Q marks. This requires alignment in semi-automatic mode, however.
-'''In mask writing mode''', i.e. where the pattern is exposed on a blank wafer, it is recommended to use a BE mark as a drift mark.
+{| cellpadding="2" style="border: 2px solid darkgray;" align="right"
+! width="200" |
+! width="200" |
+|- border="0"
+|[[File:drift.png|500px|right]]
+|[[file:DRIFT mark.png|450px|right]]
+|- align="center"
+| DRIFT measurements (by PATH DRF5M) during  || According to this table (provided by JEOL) a global mark (P) can be used as a DRIFT mark in automatic or semi-automatic alignment mode if CHIPAL 0, V1, V4 or S is used. A chip mark can be used as a DRIFT mark in any case where CHIPAL is defined to CHIPAL 1 or CHIPAL 4.
-[[file:DRIFT mark.png|450px|right]]
+|}
-You can choose any mark as a DRIFT mark. In a standard exposure, a (bottom plane) BE mark is used as DRIFT mark, but you can ask the machine to use one of your global marks as well, i.e. P or Q marks. This requires alignment in semi-automatic mode, however.
-The table below is provided by JEOL. According to this, a global mark (P) can be used as a DRIFT mark in automatic or semi-automatic alignment mode if CHIPAL 0, V1, V4 or S is used. A chip mark can be used as a DRIFT mark in any case where CHIPAL is defined to CHIPAL 1 or CHIPAL 4.
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