Specific Process Knowledge/Lithography/EBeamLithography/JBX9500Manual: Difference between revisions
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=== PDEFBE === | === PDEFBE === | ||
By using the (bottom) BE mark (specified in INITBE), the machine measures the gain and rotation of the main deflector ('''P'''rimary '''DEF'''lector using '''BE''' mark). | |||
The machines measures over a field specified in the subprogram but no larger than the main field size (1 mm x 1 mm). | |||
The output of PDEFBE looks like this: | |||
{| width=100% style = "border-radius: 10px; border: 1px solid #CE002D;" | |||
! width=100% | ========= PDEFBE Final result (0.2nA ap5) ================== | |||
|- | |||
| | |||
Field size [um] = 960.0000 | |||
Number of bottom mark retries = 1 | |||
Deflector = PDEF | |||
Previous DAC[point] Shift value[nm] Corrected DAC[point] | |||
GAIN (X Y) = -9320 -9932 0.0 1.4 -9323 -9936 | |||
ROT (X Y) = 17541 17800 -0.5 -0.6 17543 17806 | |||
Height conversion conefficient = 0.435090 | |||
Height offset = -138.560000 | |||
Height correction coefficient X Y | |||
GAIN X,Y = 1.121066e+01 1.123170e+01 | |||
ROT X,Y = -4.416959e+00 -4.248694e+00 | |||
Distortion conversion coefficient X Y | |||
GAIN X,Y = 0.000000e+00 0.000000e+00 | |||
ROT X,Y = 0.000000e+00 0.000000e+00 | |||
Reference height [um] = 0.667 | |||
difference between the bottom BE mark and the reference plane [um] = -0.064 | |||
difference between the top BE mark and the bottom BE mark [um] = 47.544 | |||
=========================================================================================== | |||
|- | |||
|} | |||
The most important output of PDEFBE is the gain shift value which is 1.4 nm (in Y); the maximum allowable gain correction in this condition file (0.2nA ap5) is 6 nm. If PDEFBE did not reach a shift value below 6 nm within 3 retries, the allowable gain correction should be increased. | |||
=== DISTBE === | === DISTBE === | ||