Specific Process Knowledge/Lithography/EBeamLithography/JBX9500Manual: Difference between revisions
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=== SFOCUS === | === SFOCUS === | ||
SFOCUS uses the bottom AE mark to measure the beam diameter while adjusting the objective lens. The objective lens is defined to be in focus where the machine finds the minimum beam diameter. This program can also be used to observe the depth of focus of a certain condition file. | {| cellpadding="2" style="border: 2px solid darkgray;" align="right" | ||
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|[[File:SFOCUS.png|400px]] | |||
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| SFOCUS uses the bottom AE mark to measure the beam diameter while adjusting the objective lens. The objective lens is defined to be in focus where the machine finds the minimum beam diameter. This program can also be used to observe the depth of focus of a certain condition file. | |||
|} | |||