Specific Process Knowledge/Characterization: Difference between revisions
No edit summary |
|
(No difference)
|
Revision as of 12:22, 12 October 2007
Choose topic
- Surface imaging
- Topographic measurement
- Stress measurement
- Filmthickness measurement
- Element analysis
- Measurement of optical constants
- Hydrophobicity measurement
- Resistivity measurement
- Wafer thickness measurement
Choose equipment
SEM: Scanning Electron Microscopy
- LEO SEM
- FEI SEM
- JEOL SEM
AFM: Atomic Force Microscopy
- Nanoman - AFM - can be used for nanomanipulation
Profiler
- Tencor
- Dektak 8 stylus profiler
Optical microscope
Optical characterization
- Ellipsometer
- Filmtek
- Prism Coupler
SIMS: Secondary Ion Mass Spectrometry
- Atomika SIMS